Effect of AIBI as Free Radical Initiator on Abrasive-Free Polishing of Hard Disk Substrate

• 作 者: REN Xiao-yan LEI Hong CHEN Ru-
• 机 构: Nano-ScienceandTechnologyResearchCenter
• 出 处: 上海大学学报：自然科学版
• 发表日期: 2014年6期
• 关键词: 机械摩擦 机械原理 磨损 摩擦 abrasive-free polishing （AFP） hard disk substrate material remov
• 基金项目: Project supported by the National Natural Science Foundation of China （51175317）, the Doctoral Program of Higher Education of China （20123108110016）

To optimize the existing slurry for abrasive-free polishing(AFP)of hard disk substrate,a water-soluble free radical initiator,2,2-azobis[2-(2-imidazolin-2-yl)propane]dihydrochloride(AIBI)is introduced to the H2O2-based slurry.The polishing results show th