Structural and optical properties of Zn_3N_2 films prepared by magnetron sputtering in NH_3-Ar mixtu

• 作 者: 吴江燕 闫金良 岳伟 李厅
• 机 构: School of Physics,Ludong University,Yantai 264025,China,
• 出 处: 半导体学报
• 发表日期: 2004年期
• 关键词: magnetron sputtering gases nitride preferred metallic attributed have intrinsic

Zinc nitride films were prepared by RF magnetron sputtering a metallic zinc target in NH_3-Ar mixture gases on glass substrate at room temperature.The effects of NH3 ratio on the structural and optical properties of the films were examined.X-ray diffraction(XRD) analysis indicates that the films are polycrystalline and have a preferred orientation of(321).An indirect optical band gap increased from 2.33 to 2.70 eV when the NH_3 ratio varied from 5%to 25%.The photoluminescence(PL) spectrum shows two emission peaks;the peak located at 437 nm is attributed to the incorporation of oxygen,and the other at 459 nm corresponds to the intrinsic emission.

Zinc nitride films were prepared by RF magnetron sputtering a metallic zinc target in NH3-Ar mixture gases on glass substrates at room temperature. The effects of NH3 ratio on the structural and optical properties of the films were examined. X-ray diffraction (XRD) Analysis shows that the films are polycrystalline and have a preferred orientation of (321) .An indirect optical band gap increased from 2.33 to 2.70 eV when the NH 3 ratio varied from 5% to 25%. The photoluminescence (PL) spectrum shows two emission peaks ; the peak located at 437 nm is attributed to the incorporation of oxygen, and the other at 459 nm corresponds to the intrinsic emission.