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对A1C13-NaC1-KC1三元无机熔融盐体系中低温电镀铝的反应步骤及速率控制步骤进行分析,对电镀过程中镀液成分以及镀铝层沉积质量进行了测定。结果表明低温熔融盐电镀铝镀液中各反应物浓度及温度等因素与铝在阴极沉积速率间存在着定量关系,由此推导出镀铝层沉积速率的动力学经验方程式:υ=2.0697[Al2Cl7-]2.5834[AlCl4-]-0.4707exp[12.04(T403T)]。结果显示,Al2Cl7-的浓度控制着整个电镀过程的进行。从而,从动力学角度解释并丰富了低温熔融盐电镀铝理论。
The reaction steps and rate control steps of low temperature electroless aluminum in A1C13-NaC1-KC1 ternary inorganic molten salt system were analyzed. The composition of plating bath and the deposition quality of aluminum coating were determined. The results show that there is a quantitative relationship between the concentration and temperature of reactants and the deposition rate of aluminum in the molten aluminum plating solution. The kinetic empirical equation for the deposition rate of the aluminum coating is deduced: υ = 2.0697 [Al2Cl7 -] 2.5834 [AlCl4 -] - 0.4707exp [12.04 (T403T)]. The results show that the concentration of Al2Cl7- controls the entire electroplating process. Thus, from the kinetic point of view to explain and enrich the low temperature molten salt aluminum plating theory.