A new approach for deposition of silver film from AgCl through successive ionic layer adsorption and

• 作 者: Johnson Henry Arockiasamy Ajaypraveenkumar Ganesan Sivakumar Kannusamy Mohanraj
• 机 构: Department of Physics, Manonmaniam Sundaranar University, Tirunelveli-627 012, Tamil Nadu, India;CIS
• 出 处: 中南大学学报（英文版）
• 发表日期: 2017年12期
• 关键词: thin films metals materials characterization sol-gel optical properties silver

An attempt was made to deposit thin film of silver onto the glass substrate by using AgCl precursor, instead of conventional precursor AgNO3with vitamin C by inexpensive and convenient successive ionic layer adsorption and reaction (SILAR) method. The deposited silver thin film was characterized by X-ray diffraction (XRD) analysis, scanning electron microscope (SEM), UV-visible and electrical I-V study. The diffraction study showed FCC structure of metallic silver in good agreement with the standard values of JCPDS (04–0783). SEM reveals flower like nano particles produced on the substrate. The surface plasmon resonance (SPR) peak in the UV-visible spectrum shows maximum absorption at 350 nm. The film shows an ohmic behavior and its electrical resistivity was found ~103Ω·cm at room temperature.