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利用直流磁控反应溅射技术在玻璃衬底上沉积了单相Ag2O薄膜,并采用真空热退火对单相Ag2O薄膜在不同热退火温度(TA)下进行了1h热处理.利用X射线衍射谱、扫描电子显微镜和分光光度计研究了TA对单相Ag2O薄膜微结构和光学性质的影响.研究结果表明,TA=300℃时Ag2O薄膜中开始出现Ag纳米颗粒,且随着TA的升高薄膜中Ag的含量明显增加.特别是当TA=475℃时Ag2O相完全转化为Ag.随着TA的升高,薄膜的表面形貌发生了由致密到疏松的结构演变.薄膜微结构的变化显示在真空热退火过程中伴随着Ag2O相热分解为Ag和O原子及O原子在体内的扩散和从表面的逃逸过程.薄膜的透射率、反射率和吸收率随TA的变化归结于热退火过程中Ag2O的热分解和薄膜结构的演变.
Single-phase Ag2O thin films were deposited on glass substrates by direct current magnetron reactive sputtering, and the single-phase Ag2O films were annealed at different annealing temperature (TA) for 1h by vacuum thermal annealing.Using X-ray diffraction, Scanning electron microscopy and spectrophotometer were used to study the effect of TA on the microstructure and optical properties of single-phase Ag2O films. The results show that Ag nanoparticles begin to appear in Ag2O films at TA = 300 ℃. With the increase of TA, The content of Ag increased obviously, especially when TA = 475 ℃, the Ag2O phase was completely transformed into Ag.When the TA was increased, the surface morphology of the film evolved from dense to loose structure.The change of the microstructure of the film was shown in In the vacuum thermal annealing process, the thermal decomposition of Ag2O phase into Ag and O atoms and diffusion of O atoms in the body and escape from the surface are accompanied by the changes of the transmittance, reflectivity and absorption rate of the film due to TA due to the thermal annealing process Thermal Decomposition of Ag2O and Evolution of Thin Film Structure.