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由于气体氧化物沸点低,分解温度低,分解产物没有腐蚀性气氛等优点,近十几年来,它们在半导体工业中用于制备高纯材料,外延生长,掺杂等,并都已进入实用阶段。在我国除甲硅烷外,其它的气体氢化物应用甚少。在实现四个现代化的过程中,随着我国电子工业的飞速发展,必将得到全面的推广和使用。本文就气体氢化物在半导体工业中的应用、制备、提纯、性质及安全使用等作一概述。错误之处望同志们批评指正。
Due to their low boiling point, low decomposition temperature and no corrosive atmosphere of decomposition products, they have been used in the semiconductor industry for the preparation of high-purity materials, epitaxial growth, doping and so on, all of which have been put into practical use . In addition to monosilane in our country, other gas hydride is rarely used. In the course of realizing the four modernizations, with the rapid development of China’s electronics industry, it will surely be promoted and used in an all-round way. This article summarizes the application of gas hydride in the semiconductor industry, preparation, purification, properties and safe use. Wrong point of view comrades hope that criticism.