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用微波等离子化学气相沉积方法 (CVD片 )用丙酮—氢气混合气体作为原料 ,在单晶硅的(111)面和人造单晶金刚石的 (10 0 )面上 ,生长出了优质金刚石薄膜 ,并对薄膜的生长规律进行了研究 .
A high-quality diamond thin film was grown on the (111) plane of monocrystalline silicon and the (10 0) plane of the artificial single crystal diamond by a microwave plasma chemical vapor deposition method (CVD sheet) using an acetone-hydrogen mixed gas as a raw material The growth of film was studied.