Monolithic integration of a silica-based 16-channel VMUX/VDMUX on quartz substrate

• 作 者: 代红庆 安俊明 王玥 张家顺 王亮亮 王红杰 李建光 吴远大 钟飞 查强
• 机 构: State Key Laboratory on Integrated Optoelectronics Institute of Semiconductors Chinese Academy of Sc
• 出 处: Journal of Semiconductors
• 发表日期: 2014年10期
• 关键词: silica quartz crosstalk waveguide interferometer grating insertion fabrication a

A monolithic integrated variable attenuator multiplexer/demultiplexer is demonstrated. It is composed of a 16-channel 200 GHz silica-based arrayed waveguide grating and an array of Mach–Zehnder interferometer thermo-optic variable optical attenuators. The integrated device is fabricated on a quartz substrate, which eliminates the process of depositing the undercladding layer and reduces the power consumption compared with a device fabricated on a silicon substrate. The insertion loss and crosstalk of the integrated device are 5 d B and less than 22 d B, respectively. The power consumption is only 110 m W at the attenuation of 20 d B per channel.

The monolithic integrated variable attenuator multiplexer / demultiplexer is implemented. It is composed of a 16-channel 200 GHz silica-based arrayed waveguide grating and an array of Mach-Zehnder interferometer thermo-optic variable optical attenuators. The integrated device is fabricated on a quartz substrate, which eliminates the process of depositing the undercladding layer and reduces the power consumption compared with a device fabricated on a silicon substrate. The power loss and crosstalk of the integrated device are 5 d B and less than 22 d B, respectively. The power consumption is only 110 m W at the attenuation of 20 d B per channel.