【摘 要】
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Niobium-doped ZnO (NZO) transparent conductive films are deposited on glass substrates by rf sputtering at 300℃.Effects of sputtering power on the structural,m
【机 构】
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State Key Laboratory on Integrated Optoelectronics,College of Electronic Science and Engineering,Jil
论文部分内容阅读
Niobium-doped ZnO (NZO) transparent conductive films are deposited on glass substrates by rf sputtering at 300℃.Effects of sputtering power on the structural,morphologic,electrical,and optical properties of NZO films are investigated by x-ray diffraction (XRD),field emission scanning electron microscopy (FESEM),Hall measurement,and optical transmission spectroscopy. The obtained films are polycrystalline with a hexagonal wurtzite structure and preferentially oriented in the (002) crystallographic direction.The minimum resistivity of 4.0×10-4 Ω cm is obtained from the film grown at the sputtering power of 170W.The average optical transmittance of the films is over 90%.
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