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采用磁控反应溅射法制备了一系列Al含量不同的Ti-Si-Al-N纳米复合薄膜,采用X射线衍射仪、扫描电子显微镜及配套能量色散谱仪研究了Al含量对薄膜组织结构、硬度及高温抗氧化性的影响。结果表明:Ti-Si-Al-N薄膜点阵常数随Al含量的增加呈下降趋势;Al含量增加到6.48at%时出现h-AlN相,此时薄膜具有最高的硬度,约33GPa;薄膜的抗氧化温度提高到约900℃,但Al含量较高易导致薄膜晶粒在高温下长大。
A series of Ti-Si-Al-N nanocomposite films with different Al contents were prepared by magnetron reactive sputtering. The effects of Al content on the microstructures and properties of the films were investigated by X-ray diffraction, scanning electron microscopy and energy dispersive spectroscopy. Hardness and high temperature oxidation resistance. The results show that the lattice constant of Ti-Si-Al-N thin film decreases with the increase of Al content. When the content of Al increases to 6.48at%, the lattice constant of h-AlN film appears and the film has the highest hardness of about 33GPa. Anti-oxidation temperature increased to about 900 ℃, but higher Al content easily lead to the growth of thin film grains at high temperatures.