HRTEM study on the ion-nitrided layers

• 作 者: 李凤照 孙东升 敖青 戴吉岩 李斗星
• 机 构: Shandong University of Technology, Jinan 250014, Laboratory of Atomic Imaging of Solids, Institute o
• 出 处: Chinese Science Bulletin
• 发表日期: 1995年13期
• 关键词: HRTEM decomposed satisfactory coherent combine outer Atomic defects matches refi

At present, because the ion-nitriding technology is applied extensively in practice, manyresearchers in the materials science field have investigated the microstructure of theion-nitrided layer. However, the defect-formation mechanism and interface structureare not clear. The authors have already found that there were vacancies and other defectsin ion-nitrided layers. This note first obtains the high resolution images and the interfacestructure atomic images of different phases in the ion bombing-nitrided layers with a high res-olution transmission electron microscope (HRTEM) and discloses the structures and interfacestructures between phases in the nitrided layers at atomic size.

At present, because the ion-nitriding technology is applied extensively in practice, manyresearchers in the materials science field have investigated the microstructure of theion-nitrided layer. However, the defect-formation mechanism and interface structureare not clear. The authors have already found that that there were vacancies and other defects in ion-nitrided layers. This note first obtains the high resolution images and the interfacestructure atomic images of different phases in the ion bombing-nitrided layers with a high res-solution transmission electron microscope (HRTEM) and discloses the structures and interfacestructures between phases in the nitrided layers at atomic size.