电子束制版自动对准控制和校正量计算程序的设计

• 作 者: 刘敬延 张重媛
• 出 处: 半导体设备
• 发表日期: 2004年期
• 关键词: 电子束 电子束曝光系统 线性畸变 对准精度 线性与非线性 集成电路工艺 计算程序 数学公式 图形发生器 畸变

在用电子束曝光系统制造大规模集成电路工艺中,电子束场的线性与非线性畸变对曝光系统的对准精度有着很大影响。本文介绍的计算机软件是专为校正电子束场的线性畸变而设计的。文中叙述了电子束自动对准的必要性、对准原理、数学公式及程序的特点。实验结果表明,本程序设计原理正确,为今后用电子束曝光系统制版实现自动对准提供了理论依据。

In electron beam lithography systems for manufacturing large scale integrated circuits, the linear and non-linear distortion of the electron beam field has a significant impact on the alignment accuracy of the exposure system. This article describes the computer software is designed to correct the linear distortion of the electron beam field and design. The article describes the necessity of electron beam automatic alignment, alignment principle, mathematical formula and program features. The experimental results show that the principle of this program design is correct, which will provide a theoretical basis for automatic alignment of plate making with electron beam exposure system in the future.