【摘 要】
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The effect of a 0.9 nm Mo interlayer at the interface of Ti film depositedon a Si substrate on phase formation of TiSi2 during annealing has been studiedby usin
【机 构】
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Laboratory of Nuclear Analyses and Techniques,Kungliga Tekniska Hogskolan
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The effect of a 0.9 nm Mo interlayer at the interface of Ti film depositedon a Si substrate on phase formation of TiSi2 during annealing has been studiedby using transmission electron micro-diffraction technique. When Ti/Mo/Si was an-nealed at low temperature as 550℃ for 30 min in Ar ambient, a metastable phase, i.e.,hexagonal C40 TiSi2, and the equilibrium phase, i.e., orthorhombic C54 TiSi2, wereboth detected. The experimental patterns of the C40 and C54 compare well with thesimulated ones.
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