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CdS films prepared with chemical pyrolysis deposition (CPD) at differ-ent temperature during film growth were characterized by XRD. Hexagon-like struc-ture appeared at the temperature of 350-500℃, while wurtzite phase was observed attemperature of 540℃ during film growth. Also CdS films prepared by CPD at 400℃were undergone post annealing at different temperature of 200-600℃ or post Ar+ ionirradiation. It is found that wurtzite phase happened when the annealing temperaturerose to 600℃. And hexagon-like structure existed at the annealing temperature from25℃ to near 500℃. Ar+ ion irradiation could not cause phase transformation, butinduce some preferred orientations and an increase in grain size for the CdS filns.