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用氦离子前角反冲技术研究了等离子体增强化学气相淀积工艺制备的红外探测器二氧化硅钝化膜膜层内的氢含量、浓度以及氢分布的深度。结果表明,所测量的氢分布深度与椭偏法所测得膜厚结果是一致的,膜层中氢的含量随淀积时间的增加是非线性的、氢含量与浓度随淀积温度和射频功率密度的增加而减少。实验也表明了膜层的腐蚀速率与氢含量的关系。
The hydrogen content, concentration and depth of hydrogen distribution in the silicon dioxide passivation film layer of infrared detector prepared by plasma enhanced chemical vapor deposition were studied by helium ion front angle recoil technology. The results show that the measured depth of hydrogen distribution is consistent with the film thickness measured by ellipsometry. The hydrogen content in the film is nonlinear with the increase of deposition time. The hydrogen content and concentration vary with deposition temperature and RF power Decreased density increases. Experiments also show that the corrosion rate of the film and hydrogen content.