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介绍了在极紫外波段 ,利用帽层材料来减少多层膜反射镜因外部环境干扰而造成的反射率降低 ,使多层膜光学元件能够长时间稳定工作 .计算了在 13 9nm波长处Mo Si极紫外多层膜反射镜在表面镀制不同帽层材料时的理论最大反射率 ,利用单纯形调优法 ,对帽层和多层膜的周期厚度进行优化 ,同时把分层理论用于多层膜帽层优化 ,可使多层膜的反射率得到进一步提高 .分析了在加入帽层前后多层膜外层电场强度的分布变化情况 .
The use of cap materials to reduce the reflectivity caused by the interference of the external environment of the multi-layer film reflector in the extreme ultraviolet wave band is introduced to enable the multi-layer optical element to work stably for a long time.Mo Si The maximum reflectance of EUV multilayer mirrors with different cap materials on the surface is optimized by using the simplex method. The periodic thickness of cap and multilayers is optimized, and the theory of stratification The optimization of the film cap layer can further improve the reflectivity of the multilayer film.The distribution of the electric field intensity of the outer layer of the multilayer film before and after adding the cap layer is analyzed.