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简要介绍了自制的聚焦离子束（ＦＩＢ）系统中束着靶点的飘移现象，分析引起飘移的原因及所采取降低飘移的措施。用此ＦＩＢ进行了一些基本图形的刻蚀研究，讨论了束流密度分布对溅射刻蚀线条宽度的影响。最后介绍了用ＦＩＢ制作光电集成电路的谐振腔面和耦合腔的一些经验。
This paper briefly introduced the drift phenomenon of target beam in FIB system and analyzed the reason of drift and the measures to reduce the drift. Some basic graphic etching studies were conducted with this FIB. The effect of beam current density distribution on the width of sputtered etched lines was discussed. Finally, some experiences of using FIB to fabricate the resonator surface and the coupling cavity of optoelectronic integrated circuits are introduced.