论文部分内容阅读
,Origin of high oxide to nitride polishing selectivity of ceria-based slurry in the presence of pico
【机 构】
：
Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, Chinese
【出 处】
：
中国物理B（英文版）
【发表日期】
：
2011年3期
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