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以CF4,CH4和N2为源气体,采用射频等离子体增强化学气相沉积法,在不同射频功率下制备了含氮氟化类金刚石薄膜样品.原子力显微形貌显示,低功率下沉积样品表面致密均匀.拉曼及傅里叶变换红外光谱分析显示,随着射频功率的改变,薄膜的结构和组分也随之变化.紫外-可见光透射光谱证明薄膜具有紫外强吸收特性,通过计算得到其光学带隙在1.89—2.29eV之间.结果表明,射频功率增加,薄膜内sp2C含量增加,或者说CC交联相对浓度增加、F的相对浓度降低,导致薄膜内π-π*带边态密度增大,光学带隙的减小.
The samples with nitrogen-containing fluorinated diamond films were prepared by radio frequency plasma enhanced chemical vapor deposition at different RF power using CF4, CH4 and N2 as the source gases.The atomic force microscopy showed that the surface of the deposited samples was compact under low power Raman and Fourier transform infrared spectroscopy analysis showed that with the RF power changes, the structure and composition of the film also will change.UV-visible light transmission spectra prove that the film has a strong UV absorption characteristics, by calculating the optical The bandgap was between 1.89 and 2.29eV.The results showed that the increase of radio frequency power, the increase of sp2C content in the film, or the increase of the relative concentration of cross-linking of CC, the relative concentration of F decreased, leading to increase of π-π * Large, optical band gap reduction.