在辉光放电甲烷等离子体中高速渗碳(续)

• 作 者: William L.Grube Jack G.Gay
• 出 处: 国外化学热处理
• 发表日期: 1980年03期
• 关键词: 渗碳 离子渗碳 等离子体 辉光放电 非平面 几何形状 真空渗碳 均匀性 扩散模型 渗碳层深度

3.渗碳层的均匀性等离子渗碳获得的渗碳层,甚至在非平面和几何形状不规则的表面上,也是特别均匀的。在给定的条件下,可以观察到等离子体严密地包围着整个工件的表面。例如:园盘试样平面的渗碳层,虽然试样只有一个平面向着阳极,但上下两个平面的渗碳层却大致相同。在带旋转曲面的或有凹槽的表面上,渗碳层也是十分均匀的。图8表明,无

3. Uniformity of carburized layer The carburized layer obtained by plasma carburization is also particularly uniform even on non-planar and geometrically irregular surfaces. Under given conditions, it can be observed that the plasma closely encloses the entire surface of the workpiece. For example, the carburized layer in the plane of the disc specimen has approximately the same carburized layer in the upper and lower planes although the specimen has only one plane toward the anode. Carburized layers are also very uniform on swirled or fluted surfaces. Figure 8 shows that none