论文部分内容阅读
采用直流溅射方法制备了厚度小于0.1μm的NiOx薄膜，研究薄膜的加热氧化及其光电特性，测量了它们的透射光谱和电阻率随薄膜中的氧含量及热处理温度的变化
The NiOx thin films with the thickness of less than 0.1μm were prepared by direct current sputtering. The thermal oxidation and the photoelectric properties of the films were investigated. Their transmission spectra and resistivity were measured with the changes of the oxygen content in the films and the heat treatment temperature