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掺杂对于薄膜光电学性能的改善具有重要意义,通过不同的掺杂,可实现不同的光电学性能需求。综述了掺杂薄膜的制备方法和光电学性能方面的研究进展,并结合目前的研究现状,对其今后可能的发展方向进行了展望。
Doping is important for the improvement of the optoelectronic properties of thin films. Different doping can realize different optoelectronic performance requirements. The research progress of the preparation methods and optoelectronic properties of doped thin films is reviewed. Combined with the current research status, the prospect of its future development is prospected.