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一、引言 英国剑桥仪器公司是世界上最早生产商品电子束曝光机的厂商之一。先后试制成功了EBMF1,EBMF2和EBMF6型电子束曝光机。EBMF6.5型机是对EBMF6改进后的新产品。但它对2型机做了重大的技术改进。改进后的6.5型机不仅保持着2型机的亚微米性能,而且使生产率提高了一个数量级。此外,既提高了图形精度,又扩大了机器的应用范围。本文将重点分析6.5型机的设计思想和对2型机的技术改进措施。
I. INTRODUCTION British Cambridge Instruments is one of the earliest producers of commercial electron beam lithography machines in the world. Successfully trial-and-succeeded EBMF1, EBMF2 and EBMF6 type electron beam exposure machine. EBMF6.5 machine is a new product improved on EBMF6. But it made major technological improvements to the Type 2 machine. The modified 6.5 not only maintains the sub-micron performance of the Model 2 but also increases productivity by an order of magnitude. In addition, not only improve the graphics accuracy, but also expand the scope of application of the machine. This article will focus on the analysis of the design of the 6.5-type machine and 2-type machine technical improvements.