MICROSTRUCTURE AND PROPERTIES OF ANNEALED ZnO THIN FILMS DEPOSITED BY MAGNETRON SPUTTERING

• 作 者: J.Lee W.Gao Z.Li M.Hodgson A.A
• 机 构: DepartmentofMechanicalEngineering,DepartmentofChemicalandMaterialsEngineering,DepartmentofChemistry
• 出 处: 金属学报：英文版
• 发表日期: 2005年3期
• 关键词: 氧化锌薄膜 微结构 磁溅射工艺 被动沉积退火 zinc oxide thin films microstructure magnetron sputteri
• 基金项目: 新西兰研究科学与技术基金，澳大利亚核科学工程研究所项目

ZnO thin films were deposited on a glass substrate by dc (direct current) and rf (radio frequency) magnetron sputtering. Post-deposition annealing was performed in different atmospheres and at different temperatures. The correlation of the annealing condi