【摘 要】
:
Thin films of tungsten disulfide (WS2) were deposited on 3Cr13 martensitic stain less steel substrate by RF sputtering.The as-deposited films were annealed at 200,400 and 600℃ for 2h in vacuum.The vac
【机 构】
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Vacuum and Fluid Engineering Research Center of Northeastern University Shenyang 110004 China
【出 处】
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第四届国际表面与界面科学与工程学术会议(The Fourth International Conference on S
论文部分内容阅读
Thin films of tungsten disulfide (WS2) were deposited on 3Cr13 martensitic stain less steel substrate by RF sputtering.The as-deposited films were annealed at 200,400 and 600℃ for 2h in vacuum.The vacuum degree was 5×10-4Pa.Composition,surface morphology,structure properties and tribological behavior were studied by EDS,SEM,X-ray diffraction techniques and tribometer,respectively.At 200℃,the films showed low crystallization structure and the tribological behavior was not improved obviously.But at 400℃,the films tribological behavior were improved obviously and non-crystalline to hexagonal structural transition appeared.When annealing temperature rose to 600℃,the films were desquamated from substrate.The results suggested that suitable vacuum annealing was able to promote crystallization and improve tribological performance of RF sputtering WS2 films.
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