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Atomic Layer Deposition as an Efficient Tool for the Design of 1-D Nanostructures
【机 构】
：
Nanotechnology,Institute of Microsystems Engineering,Faculty of Engineering,Albert Ludwigs Universit
【出 处】
：
第一届国际ALD应用大会暨第二届中国ALD学术交流会
【发表日期】
：
2012年4期
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