Thin film deposition using rarefied gas jet

来源 :2015 Shanghai Thin Film Conference(2015上海薄膜国际会议) | 被引量 : 0次 | 上传用户:Melanzpl1
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  The rarefied gas jet of Aluminium is studied at Mach number Ma =(U_j/sqrt{kb T_j/m})in the range 0.01 < Ma < 2,and Knudsen number Kn =(1/(sqrt{2} pi d^2 n_d H)in the range 0.01 < Kn < 15,using two-dimensional(2D)Direct Simulation Monte Carlo(DSMC)simulations [1,2,3,4,5,6],to understand the flow phenomena and deposition mechanisms in a physical vapor deposition(PVD)process.Here,H is the characteristic dimension,U_j and T_j are the jet velocity and temperature,n_d is the number density of the jet,d is the molecular diameter,and kb is the Boltzmann constant.In 2D DSMC simulations we frnd that the jet velocities both before and after the substrate reduces as the Knudsen number is decreased(increasing the number density).As Knudsen number decreases,the gas jet became much more concentrated on the centerline,and the gas depleted region behind the substrate(flat plate)decreases due to the decrease in the stream-wise velocity and hence increased residence time.The decreased Knudsen number(smaller mean free path)confined the gas jet to the centerline by reducing the rate of lateral diffusion.Increasing jet Mach number also leads to a narrowing of the gas jet.This results from the higher jet velocity,and hence higher momentum of the gas jet along the stream wise direction,which reduces the transverse scattering effects of collisions.We examine the jet streamlines in the vicinity of the substrate by determining the average trajectories along the simulation cells.The variation of local flux along the stream-wise direction away from the jet are studied.The qualitative nature of the local flux at high Mach number(Ma =2)is similar to those in the incompressible limit(Ma =0.01).These include the initial fast decay,then slow variation,and finally rapid decay near the substrate.However,there are important differences.The amplitudes of the local flux increase as the Mach number increases.The flux decreases by an order of magnitude before reaching to the substrate.There is significant velocity and temperature slip [1,2] at the solid surfaces of the substrate.In a compressible rarefied jet flow,we determine the local flux deposited on the substrate surface with the thermal accommodation coefficient equal to 1.The gas atom concentration in the jet slowly decreases due to the infrequent scattering,and deposition occurs due to the reduced diffusion distance.The gas flux profile at the front and rear surfaces of the substrate is determined,and show significant dependence upon the Knudsen number.An important fimding is that the capture width(cross-section of the gas jet deposited on the substrate)is symmetric around the centerline of the substrate,and decreases with increased Mach number due to an increase in the momentum of the gas molecules.DSMC simulation results reveals that lower Knudsen number result in shorter mean free paths,and atoms experience more collisions,which direct them toward the substrate.However,the atoms also move with lower momentum,which allows scattering collisions to rapidly direct the atoms to the substrate.Higher Knudsen number result in longer mean free paths,and atoms can travel greater distances without depositing onto the substrate.Changing the Mach number influenced the flux profile by controlling the momentum of the incident gas atoms.At high Mach number,the gas atoms had large momentums,which increased the distance atoms traveled before depositing onto the substrate.A very small Mach number resulted in atoms depositing quickly near the centerline of the substrate.
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