Large-Area High-Resolution Nanostructures Fabricated by Broadband XIL Technology and Its Application

来源 :The 6th International Conference on Nanoscience and Technolo | 被引量 : 0次 | 上传用户:dillon100200
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  A large area exposure technology with high-resolution nanostructure using broadband soft X-ray interference lithography(XIL)is developed by beamline BL08U1B at SSRF [1].
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