Fabrication of sub-20 nm Nanopore Arrays in Membranes with Embedded Metal Electrodes at Wafer Scales

来源 :中国微米纳米技术学会纳米科学技术分会第三届年会暨2014全国纳米生物与医学学术会议 | 被引量 : 0次 | 上传用户：s8583527

【摘要】

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【作者】

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Yanxiao Feng Deqiang Wang Jingwei Bai Sung-wook Nam Hongbo Peng Robert Bruce Lynn Gignac Markus Brink Ernst Kratschmer Stephen Rossnagel Phil Waggoner Kathy Reuter Chao Wang Yann Astier Binquan Luan Y

【机构】

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No. 266 Fangzheng Avenue,Beibei District,Chongqing,China 400714 1101 Kitchawan Road,IBM T.J. Watson

【出处】

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中国微米纳米技术学会纳米科学技术分会第三届年会暨2014全国纳米生物与医学学术会议

【发表日期】

：

2014年6期

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We introduce a method to fabricate solid-state nanopores at sub-20 nm diameter in membranes with embedded metal electrodes across a 200 mm wafer with CMOS compatible semiconductor processes.Multi-layer (metal-dielectric) structures embedded in membranes were demonstrated with high uniformity (± 0.5 nm) across the wafer.Arrays of nanopores were fabricated with average size of 18 ± 2 nm in diameter using a Reactive Ion Etching (RIE) method in lieu of TEM drilling.

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Fabrication of sub-20 nm Nanopore Arrays in Membranes with Embedded Metal Electrodes at Wafer Scales

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