Raman spectrum of hydrogen-free amorphous carbon films deposited at various experiment parameters by

来源 :第四届国际表面与界面科学与工程学术会议(The Fourth International Conference on S | 被引量 : 0次 | 上传用户:hgq41102
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  Amorphous carbon film is one of the most important anti-reflection protective films coated on infrared optics opponents.In this paper,hydrogen-free amorphous carbon films were deposited by new type surface-wave-sustained plasma (SWP) source with a graphite target at various experiment parameters.The laser Rarnan spectroscopy at wavelength of 514 nm was used to investigate the structure and bonding of these carbon films.The results showed consanguineous correlations between the intensity ratio ID/IG and the experiment parameters such as microwave power,target voltage and gas pressure applied to the SWP source.Raman spectra proved the structure of these carbon films prepared by SWP technique is typical diamond-like carbon (DLC).The analysis on G peak position and intensity ratio ID/IG indicated that Raman shifts moves to low wavenurnber and ID/IG decreases with the increasing of microwave power from 150 W to 330 W.These results means the formation of sp3 bond prefers higher microwave power.DLC films prepared at target voltage of-200 V have higher sp3 content than that of-350 V,moreover,an increase of gas pressure during experiments yields higher sp3 content at the microwave power below 270 W,whereas the change of sp3 content is slight with the various conditions when microwave power exceeds 270 W.
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