Gas Injection as a Tool for Process Control During the Impulse Plasma Deposition

来源 :The 8th Asian-European International Conference on Plasma Su | 被引量 : 0次 | 上传用户：kissall

【作者】

：

K.Zdunek K.Nowakowska-Langier R.Chodun J.Dora

【机构】

：

Faculty of Materials Science,Warsaw University of Technology,Woloska 141,Warsaw 02-507,Poland;The An

【出处】

：

The 8th Asian-European International Conference on Plasma Su

【发表日期】

：

2011年1期

【关键词】

：

Plasma surface engineering Impulse plasma IPD

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Gas Injection as a Tool for Process Control During the Impulse Plasma Deposition

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