Gas Barrier Properties of SiON Films Deposited as a Function of the Plasma Process Parameters at Low

来源 :The 8th Asian-European International Conference on Plasma Su | 被引量 : 0次 | 上传用户：zhoukang3201

【作者】

：

Su B.Jin Yoon S.Choi In S.Choi Jeon G.Han

【机构】

：

Center for Advanced Plasma Surface Technology,Sungkyunkwan University,300 ChunChun-dong,Jangan-gu,Su

【出处】

：

The 8th Asian-European International Conference on Plasma Su

【发表日期】

：

2011年1期

【关键词】

：

WVTR Low temperature Plasma process Chemical structure

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Gas Barrier Properties of SiON Films Deposited as a Function of the Plasma Process Parameters at Low

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