Reliable Fabrication of Sub-10-nm Gaps for Plasmonic Applications

来源 :International Conference on Nanoscience & Technology,China 2 | 被引量 : 0次 | 上传用户：Phoenix164

【摘要】

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Nanogaps between metal nanostruetures are useful in localizing optical energy in plasmonic antennas, but are challenging to directly pattern.In this talk, we will present several methods we developed

【作者】

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Huigao Duan Hailong Hu Michel Bosman Joel K.W.Yang

【机构】

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Key Laboratory for Micro-Nano Optoelectronic Devices of Ministry of Education,Hunan University,Chang

【出处】

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International Conference on Nanoscience & Technology,China 2

【发表日期】

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2013年3期

【关键词】

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Plasmonics Plasmon coupling Sub-10-nm Nanofabrication

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　　Nanogaps between metal nanostruetures are useful in localizing optical energy in plasmonic antennas, but are challenging to directly pattern.In this talk, we will present several methods we developed recently to reliably fabricate sub-10-nm gaps by combining high-resolution electron-beam lithography and a lift-offprocess.With these tiny gaps, we have systematically studied the strong plasmon coupling at the single nanometer scale using electron energy-loss spectroscopy (EELS), dark-field scattering spectroscopy, and photoluminescence.

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Reliable Fabrication of Sub-10-nm Gaps for Plasmonic Applications

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