【摘 要】
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Atomic layer deposition(ALD)is a powerful deposition technique for constructing uniform,conformal and ultrathin films in microelectronics,photovoltaics,cata
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Atomic layer deposition(ALD)is a powerful deposition technique for constructing uniform,conformal and ultrathin films in microelectronics,photovoltaics,catalysis,energy.[1,2] The possible reaction pathways for the room-temperature atomic layer deposition(RT-ALD),Plasma-enhanced atomic layer deposition(PE-ALD),and rapid atomic layer deposition(RALD)of SiO2 are investigated by using DFT calculations.
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