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In this paper, the impacts of ionizing radiation on the gate induced floating body effects (GIFEBs) and low-frequency (LF) noise for the 130nm partially depleted silicon-on-insulator (PDSOI) N-type metal-oxide semiconductors (NMOS) transistor with an ultrathin gate oxide have been investigated.It is shown that the second transconductance gm peak becomes smaller after irradiation when the Lorentzian-like excess noise is more pronounced.A new interpretation is proposed to explain the changes in the GIBFEs and excess noise.