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以ZrCl4、CH4为源气,H2和Ar为稀释气体和载气,采用化学气相沉积法(CVD)制备了ZrC涂层,研究了源气C/Zr比对ZrC涂层组成及形貌的影响。通过表征得出ZrC涂层表面比较粗糙,随着源气中C/Zr减小,ZrC涂层表面块状颗粒更致密,颗粒大小趋于一致;ZrC涂层中有Zr、C、O元素,含有化学计量比为1:1的ZrC相和自由碳相,随着源气中C/Zr减小,涂层中Zr的原子分数相应增大,涂层中只有约20%的Zr元素与C结合形成ZrC。
The ZrC coating was prepared by chemical vapor deposition (CVD) using ZrCl4 and CH4 as source gases and H2 and Ar as diluent gases and carrier gases. The effect of C / Zr ratio of source gas on the composition and morphology of ZrC coatings was investigated . The results show that the surface of ZrC coating is rough, with the reduction of C / Zr in the source gas, the massive particles on the surface of ZrC coating are more compact and the particle size tends to be uniform; Zr, C and O elements are present in the ZrC coating, With the stoichiometric ratio of 1: 1 ZrC phase and free carbon phase, with the reduction of C / Zr in the source gas, the atomic fraction of Zr in the coating increases correspondingly, only about 20% of the Zr element in the coating and C Combined to form ZrC.