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采用封闭式电子回旋共振(M CECR)等离子体溅射的方法在硅(100)基片上沉积了高质量的硬碳纳米微晶薄膜,膜层厚度约40 nm,采用氩等离子体溅射碳靶。薄膜的键结构采用X射线光电子能谱仪(XPS)分析,纳米结构采用高分辨率透射电子显微镜(HRTEM)分析。本文研究了基片偏压对薄膜的纳米结构、摩擦特性(摩擦系数及磨损率)以及薄膜的纳米硬度的影响。摩擦特性采用POD摩擦磨损仪测试,纳米硬度采用纳米压入仪测试。
A closed-loop electron cyclotron resonance (M CECR) plasma sputtering method was used to deposit high-quality hard carbon nanocrystalline thin films on a silicon (100) substrate with a thickness of about 40 nm. The plasma was sputtered with argon plasma . The bond structure of the films was analyzed by X-ray photoelectron spectroscopy (XPS), and the nanostructures were analyzed by high resolution transmission electron microscopy (HRTEM). In this paper, the effects of substrate bias on the nanostructures, tribological properties (friction coefficient and wear rate) and nano-hardness of the films were investigated. Friction characteristics of the test using POD friction wear tester, nano-nano-indentation hardness tester.