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1999年5月9～14日在加拿大Alberta省Jasper城召开了第8届金属及半导体材料表面钝性研究国际会议,主要交流自1993年第7届国际钝性会议以来在金属及半导体表面钝性研究方面的进展,以及有关钝性研究手段方面的突破。会议主题是金属及半导体材料表面钝性的分子和原子过程,以及在纳米尺度上的钝性机理。有22个国家近140名代表在会上发表了论文138篇。会议交流和讨论了钝化膜成分
The 8th International Conference on Surface Bluntness Research for Metallic and Semiconducting Materials was held in Jasper, Alberta, Canada from May 9th to May 14th, 1999, mainly on the blunt surface of metals and semiconductors since the 7th International Blunt Conference in 1993 Advances in research, and breakthroughs in blunt research tools. The conference theme is the blunt molecular and atomic processes on the surface of metals and semiconductor materials, as well as the blunting mechanism at the nanoscale. Nearly 140 representatives from 22 countries made 138 papers at the conference. The meeting exchanged and discussed the passivation film composition