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由于膜基附着力不好,膜层脱落问题是工业生产中磁控溅射镀制黑膜最常见的问题。本实验采用阳极线性离子源和霍尔点源辅助磁控溅射复合技术制备了TiNC薄膜,探讨解决TiNC膜基附着力不好的问题。初步实验结果表明,离子束辅助沉积对于改善膜基附着力的作用并不明显,本文还比较了脉冲偏压清洗对膜基附着力的影响,探讨了其可能影响因素。
As the film-based adhesion is not good, the problem of film off is the most common problem of magnetron sputtering black film in industrial production. In this experiment, anodic linear ion source and Hall point source assisted magnetron sputtering composite technology prepared TiNC film, to explore to solve the problem of poor adhesion TiIC film base. Preliminary experimental results show that the effect of ion beam assisted deposition on improving the adhesion of the film base is not obvious. The effect of pulse bias cleaning on the film adhesion is also compared, and the possible influencing factors are discussed.