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前言 在毛主席革命路线指引下,我们组的工人同志破除迷信,以《二论》为指导,大胆实践,于七四年试制并投产了氧化铬光刻掩模。两年来的生产实践证明,这是一种优于铬版的掩模版。这里,我们把这种掩模的制备工艺简单地小结一下。 我们组原来是制备和使用铬版的。铬版确实存在一些缺点,特别是它的反射性强而又基本上不透明,也较易产生针孔。随着器件水平的提高,它逐渐和生产不相适应。许多兄弟单位都展开了选择透明掩模的研制工作。学习了兄弟单位的先进经验,考虑到本单位的条件,我们决定试制氧化铬掩模。因为它的制造工艺比较简便,材料来源丰富、设备是现存的镀膜台,比较容易上马。在车间光刻同志的积极配合下,我们组的工人同志连日奋战,在不到一个月的时间里就制成了氧化铬掩模。经光刻试用,反应良好。很快就在全厂推广,完全替代了铬版。
Foreword Under the guidance of Chairman Mao’s revolutionary line, the workers in our group broke away from superstition. Under the guidance of the “second theory,” they bravely put into practice and trial and put into production the chromium oxide lithography mask in 1974. Two years of production practice has proved that this is a better than chromium version of the reticle. Here, we briefly summarize the preparation of this mask. Our group turned out to be chrome-plated. Chromium plate does have some shortcomings, especially its strong reflectivity and basically opaque, but also easier to produce pinholes. As the level of devices increases, it gradually becomes incompatible with production. Many fraternal units have started the development of a choice of transparent masks. Studied the advanced experience of brother units, taking into account the conditions of the unit, we decided to trial chromium oxide mask. Because of its manufacturing process is relatively simple, rich source of materials, equipment is the existing coating Taiwan, the more easily launched. With the active cooperation of the litho comrades in the workshop, the workers in our group fought day by day and made the chromia mask in less than a month. After lithography trial, the reaction is good. Soon in the whole plant promotion, completely replace the chromium version.