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用空心阴极离子镀制备了Ｔｉ（Ａｌ）Ｎ和ＴｉＮ涂层．０．５ｍｏｌ／Ｌ的Ｈ２ＳＯ４溶液中极化曲线结果表明，Ｔｉ（Ａｌ）Ｎ涂层的耐蚀性优于ＴｉＮ涂层．电子探针（ＥＰＭＡ）、Ｘ射线衍射和扫描电镜（ＳＥＭ）等分析了Ｔｉ（Ａｌ）Ｎ涂层的元素分布特征及组织结构：Ａｌ元素在界面处富集，呈连续带状分布，并以单质状态存在；与单一ＴｉＮ涂层相比，Ｔｉ（Ａｌ）Ｎ涂层为不贯穿的更致密的柱状晶和纤维状组织结构．对涂层组织结构与耐蚀性进行了探讨．
Ti (Al) N and TiN coatings were prepared by hollow cathode plating. Polarization curve in 0.5mol / L H2SO4 solution shows that the corrosion resistance of Ti (Al) N coating is better than that of TiN coating. Electron probe (EPMA), X-ray diffraction and scanning electron microscopy (SEM) were used to analyze the elemental distribution and microstructure of Ti (Al) N coating: Al was enriched at the interface and continuously distributed in the form of Elemental states exist; the Ti (Al) N coating is a denser, denser columnar and fibrous structure than the single TiN coating. The coating structure and corrosion resistance were discussed.