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针对光刻系统分辨力和焦深的矛盾 ,详细研究了二元光栅照明对硅片上光强以及对光刻系统传输频率的影响 .结果表明 ,二元光栅照明可显著提高光强的对比度 ,改善成象系统的频率传递函数 ,是一种比较理想的离轴照明技术。
Aiming at the contradiction between resolving power and depth of focus of lithography system, the effect of binary grating illumination on the intensity of light on the silicon wafer and the transmission frequency of the lithography system is studied in detail.The results show that the binary grating illumination can significantly improve the contrast of light intensity, Improve the imaging system frequency transfer function, is an ideal off-axis lighting technology.