论文部分内容阅读
本文研究了非晶态As_2S_3 膜在其T_g 点以下光学厚度(nd)的时间依从性与温度依从性,以及热历史对As_2S_3 膜的折射率、折射率的光致变化特性的影响。实验结果表明:新制备的As_2S_3 膜在其T_g点至室温间的温度范围内发生着显著的结构弛豫。由于这种结构弛豫,使As_2S_3 膜的折射率、折射率的光致变化特性强烈地依赖于其热历史。经过不同程度的热处理后,膜的折射率增加,折射率的光致变化减少,但并未显著改变光化反应的速度常数。
In this paper, the temporal dependence and temperature dependence of optical thickness (nd) of amorphous As_2S_3 film below the T_g point and the effect of thermal history on the photodiffraction of refractive index and refractive index of As_2S_3 films were investigated. The experimental results show that the freshly prepared As_2S_3 film exhibits significant structural relaxation within the temperature range from Tg to room temperature. Due to this structural relaxation, the photo-induced change in refractive index and refractive index of the As 2 S 3 film strongly depends on its thermal history. After different degrees of heat treatment, the refractive index of the film increases and the photoreaction of the refractive index decreases, but does not change the speed constant of the photochemical reaction significantly.