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采用四种不同微观组织的钛靶,在同一沉积条件下在高速钢基底上磁控溅射得到氮化钛薄膜。研究了该四种氮化钛薄膜的表面形貌、表面粗糙度、表面颗粒、断口形貌、薄膜厚度、纳米硬度和相结构等。结果表明:随着等轴晶钛靶的晶粒尺寸的增大,氮化钛薄膜的表面粗糙度减小,表面颗粒尺寸、薄膜中氮含量、柱状晶尺寸、薄膜厚度、硬度均先变小后变大。魏氏组织钛靶沉积得到的氮化钛薄膜具有表面光滑、表面颗粒细小、柱状晶细小、硬度居中等特点。薄膜的硬度主要与薄膜中TiN(111)的择优取向程度有关,择优取向度越高,硬度越高。
Titanium nitride films of four different microstructures were obtained by magnetron sputtering on a high speed steel substrate under the same deposition conditions. The surface morphology, surface roughness, surface grains, fracture morphology, film thickness, nano-hardness and phase structure of the four titanium nitride films were studied. The results show that with the increase of the grain size of the equiaxed titanium target, the surface roughness of the titanium nitride film decreases, the surface particle size, nitrogen content in the film, columnar grain size, film thickness and hardness decrease After the larger. Titanium nitride films deposited by Widmanstatten Ti target have the characteristics of smooth surface, small surface grains, small columnar grains and moderate hardness. The hardness of the film is mainly related to the preferred orientation of TiN (111) in the film. The higher the preferred orientation is, the higher the hardness is.