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日本于2001年8月起开始实施“半导体未来工程”，研究开发线宽在纳米级的半导体元件制造工艺。据经济产业省新能源产业技术综合开发机构日前发表的科研信息说，这一科研计划将由政府、大学和企业组成的联合开发组织——超尖端电子技术开发机构实施。在今后7年内开发线宽为50~70
Japan began implementing the “Semiconductor Future Project” in August 2001 to research and develop semiconductor devices with nanowires bandwidth. According to a research report published recently by the New Energy Industries Technology Development Agency of the Ministry of Economy, Trade and Industry, the research program will be implemented by a joint venture development organization composed of governments, universities and enterprises - a state-of-the-art electronic technology development organization. In the next seven years the development of line width of 50 to 70