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上海光源二期工程拟建的超硬多功能线站将采用一台弧矢聚焦高能劳厄单色器,晶体压弯机构是单色器的核心部件,晶体弧矢半径与子午半径的优化对单色器的光通量和分辨率有很大影响。本文利用有限元软件分析了影响劳厄晶体压弯性能的主要因素——斜切晶体的各向异性以及晶体的长宽比。通过分析,确定了硅晶体切割边为[011]方向和[0-11]方向,晶体的优化尺寸为90 mm×40 mm×1 mm。硅晶体表面的弧矢和子午面形误差(均方根)分别为3.02μrad和1.25μrad,满足设计要求。
Shanghai Light Source Phase II proposed super-hard multi-function line station will use a sagittal focusing high energy Laue monochromator, crystal bending and bending mechanism is the core part of the monochromator, the optimization of crystal radius and radial radius Monochromator flux and resolution have a significant impact. In this paper, the main factors influencing the buckling performance of Laue crystal, the anisotropy of the beveled crystal and the aspect ratio of the crystal, were analyzed by finite element software. Through the analysis, it is confirmed that the optimized size of the crystal is 90 mm × 40 mm × 1 mm for the [011] direction and [0-11] direction of the silicon crystal. The sagittal and meridional errors (root mean square) of the silicon crystal surface are 3.02μrad and 1.25μrad, respectively, satisfying the design requirements.