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大面积矩形电弧蒸发源合理的设置靶源磁场并有效的控制电弧弧斑的运动是十分重要的。本文基于大量的试验研究对电磁场在靶面各处产生的磁场强度的计算进行了理论推导，建立了数学模型，并进行了比较精确的计算。计算结果与实测值很好的吻合，该计算可作为大面积矩形电弧蒸发源电磁场设计的依据。
It is very important for large-area rectangular arc evaporation source to reasonably set the target magnetic field and effectively control the arc arc spot movement. Based on a large number of experimental studies, this paper theoretically deduces the calculation of the magnetic field intensity generated by the electromagnetic field around the target surface, establishes the mathematical model and carries out more accurate calculations. The calculated results are in good agreement with the measured values. This calculation can be used as the basis for the electromagnetic field design of a large-area rectangular arc evaporation source.