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采用粉末渗硼法在850℃至104(?)℃得到钴的硼化层,经金相分析、显微硬度测定和X射线衍射分析,结果表明:硼化层由CoB、Co_2B和Co_3B等三种不同含硼量的硼化物相组成,每相之间有明显的相界面,具有高硬度(CoB相的硬度为HV_(100) 1500～1700、Co_2B HV_(100) 1300～1500、Co_3B HV_(100) 1100～1300)。硼化试样未经腐蚀即可观察到决状的黑色组织。经扫描电镜扫描和电子探针的定点分析,确认黑色组织实为渗硼层中的微孔,在850℃以上渗硼时在硼化层中产生,而且随渗硼温度升高而增加。在真空Ar气保护下渗硼,孔洞大大减少。由于微孔的存在,使得硼化层近表面具有疏松结构。
The boronization layer of cobalt was obtained by powder infiltration method at 850 ℃ to 104 (?) ℃. The results of metallographic analysis, microhardness measurement and X-ray diffraction analysis showed that the boronized layer consisted of three kinds of CoB, Co_2B and Co_3B Boron species with different boron content have obvious phase interface between each phase and have high hardness (the hardness of CoB phase is HV 1500 ~ 1700, Co 2 B HV 100 100 1500, Co 3 HV_ ( 100) 1100 to 1300). Boronized samples were observed without erosion of the decayed black tissue. Scanning electron microscopy and electron probe fixed-point analysis confirmed that the black tissue is actually a porous layer of boronizing, nitriding above 850 ° C in the boronized layer, and increases with increased boronizing temperature. Boron in the vacuum Ar gas protection, holes greatly reduced. Due to the existence of micropores, the boride layer has a loose structure near the surface.