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本文介绍一种适用于亚微米光刻的硅片步进式光刻机。该机总的重复精度为76nm(3σ)。投影透镜是新型Ⅰ线大数值孔径的蔡斯透镜10.78.48。采用1.3微米厚的标准型抗蚀剂,整个象场内0.7微米的图象都很清晰。
This article describes a suitable for submicron lithography wafer stepper lithography. The aircraft’s total repeatability of 76nm (3σ). Projection lenses are the new type I large linear aperture Zeiss lenses 10.78.48. Using a standard 1.3-μm thick resist, the entire 0.7-μm field image is clear.