PREPARATION OF TiN FILMS BY N_2 ASSISTED Xe~+ ION BEAM ENHANCED DEPOSITION AND THEIR MECHANICAL PROP

• 出 处: Acta Metallurgica Sinica(English Edition)
• 发表日期: 1992年11期
• 关键词: evaporation preparing hardness scratch graphite BEAM friction implies have sized

A new method for preparation of hard TiN films has been developed by using electronbeam evaporation-deposition of Ti and bombardment with 40 keV Xe~+ ion beam ina N_2 gas environment.The synthesized TiN films were superior to PVD and CVDones in respects of improved adhesion to substrate and low preparing temperature.Theyexhibited good wear resistance and high hardness up to 2200 kg/mm~2.Some industrialapplications have been reported.

A new method for preparation of hard TiN films has been developed by using electron beam evaporation-deposition of Ti and bombardment with 40 keV Xe ~ + ion beam ina N_2 gas environment. Synthetic TiN films were superior to PVD and CVDones in respects of improved adhesion to substrate and low preparing temperature. the good retard resistance and high hardness up to 2200 kg / mm ~ 2.Some industrialapplications have been reported.